Taoyuan, Taiwan, March 22nd, 2007 - Inotera Memories, Inc.(TAIEX:3474)announced and celebrated today the grand opening of its second 300mm semiconductor manufacturing facility (its so-called “Fab-2”) in Taoyuan, Taiwan. Fab-2 will initially manufacture dynamic random access memory (DRAM) chips on 300mm wafers using 90nm trench technology transferred from a joint-development project between Nanya Technology Corp. (“NTC”) from Taiwan and Qimonda AG (“Qimonda”) from Germany. Inotera has already started transferring NTC's and Qimonda's leading-edge 75/70nm trench technology and expects to start volume ramp in this technology in the 4th quarter of 2007.
Inotera's Fab-2 had its groundbreaking in May of 2005 and started its equipment move-in and installation in mid-October of 2006, two weeks ahead of the original schedule. The Company's Fab-1 and Fab-2 have been designed as “twin fabs”, which means that the two manufacturing facilities are physically connected by a clean room bridge in order to run them as one integrated operation to maximize efficiency and capacity.
In his speech, Charles Kau, President of Inotera, described Fab-2 as an important milestone for the Company's future development. After implementing the learnings from a record-setting volume ramp of Fab-1 in 2004 and 2005, Fab-2 is expected to ramp up even faster, further enhancing the Company's future cost effectiveness and manufacturing efficiency. The Company targets to reach a combined capacity of Fab-1 and Fab-2 of 120 thousand 300mm-wafer starts per month by the end of year 2007.
Cumulative Fab-2 capital expenditures to reach its full capacity by the end of year 2007 are expected to be 78 billion NTD. As a result of the increased capacity combined with other improvements in manufacturing efficiency, the Company expects the total bit output will increase by at least 70% in year 2007 compared to last year.
Furthermore, in order to sustain the future growth, Inotera has received approval from Taoyuan County Government to purchase land for building its third 300mm semiconductor manufacturing facility (“Fab-3”). The construction and commissioning of Fab-3 will be planned and executed according to market demand.
About Inotera
Inotera Memories, Inc. was incorporated on January 23rd, 2003. Inotera was founded as a joint venture by Infineon Technologies AG and Nanya Technology Corporation. Inotera’s production facility has been designed to manufacture high-density and high-performance commodity DRAM(Dynamic Random Access Memory)products using state of the art trench technology. The collaboration of Qimonda’s (the former Memory Products Group recently carved out from Infineon Technologies) world leading technology and Nanya’s cost efficiency in mass production have developed an innovative facility which are highly productive, highly competitive and leading edge in the DRAM industry.
For more information please visit: http://www.inotera.com
Spokesperson
President, Charles Kau
Press Contact
Jennifer Chien
Tel. 03-327-2988 Ext. 3938
E-mail:jenniferchien@inotera.com
Disclaimer
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